Imprentus won a new contract to provide customers with high-precision diffractio

On October 5, the US diffraction grating technology and product developer Imprentus announced that it had won a new contract to provide EUV Tech, the supplier of EUV measurement products, with customized luminous diffraction gratings for semiconductor measurement. At present, the contract amount has not been disclosed.

Specifically, Imprentus and EUV Tech will work together to optimize the design of optical components to maximize the efficiency and optical characteristics of semiconductor metering applications.

Image source: Imprentus official website

For this cooperation, Patrick Naulleau, CEO of EUV Tech, said: "The cooperation with the Imprentus team has enabled EUV Tech to significantly shorten the time to market in developing a unique new EUV mask phase measurement tool, while also providing the most advanced optical components."

Founded in 1997, EUV Tech is headquartered in Martinez, California, USA. It can design, manufacture and provide wavelength EUV measurement tools for the semiconductor industry.

Founded in 2012, Imprentus, headquartered in Illinois, USA, focuses on designing, manufacturing and selling diffraction gratings for synchrotron radiation facilities, semiconductor manufacturing and augmented reality (AR) waveguides. Its customers include many Fortune 500 enterprises, academic institutions and government laboratories.

Since its establishment, the company aims to commercialize innovative nano scale engraving technology. This technology is a general method of high precision curved surface graphics, which is particularly suitable for the manufacturing of X-ray and EUV diffractive optical products. It must be formed with an accuracy of 0.1 degree angle, and positioned with nanometer accuracy over a distance of tens of centimeters.

It is reported that improving the optical efficiency in the application of X-ray, ultraviolet and visible spectrum analysis is the long-term goal of the laser, spectroscopy and synchronous light source markets. In the past two years, Imprentus has been able to provide better diffraction grating specifications, thus providing higher optical efficiency, new in beam diagnostic functions, and higher resolution than previous commercial applications. These improvements cannot be achieved using standard diffraction grating ruling technology. In the past few years, Imprentus has made breakthroughs and provided support to its synchrotron and free electron laser customers.

At present, its diffraction gratings are further infiltrating into the commercial applications of the high-power laser market for manufacturing, scientific research and various applications of surface patterns, and will use metal and dielectric coatings to reduce laser induced damage threshold (LIDT). These light emitting gratings also provide higher optical efficiency, combined with a wide range of wavelengths, for use in subsystems of atomic spectrometers and analytical systems. These new grating designs make it possible to improve the efficiency and sensitivity of spectral instruments, while providing the potential to reduce the number of optical elements in the optical subsystems of these instruments, thereby reducing their cost and complexity.

At present, Imprentus has been able to continuously achieve resolution specifications of more than 500000, which is very valuable for synchrotron and other laser applications. In addition to this new contract, Imprentus has previously won a contract of 248000 dollars to provide ultra-high precision diffraction gratings for the SLAC National Accelerator Laboratory of the US Department of Energy; The company was also awarded a contract of more than 200000 US dollars to provide high efficiency diffraction gratings for European X-ray free electron lasers.

Source: OFweek