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Recently, the semiconductor industry has adopted Extreme Ultraviolet Lithography (EUVL) technology. This cutting-edge photolithography technology is used for the continuous miniaturization of semiconductor devices to comply with Moore's Law. Extreme ultraviolet lithography (EUVL) has become a key technology that utilizes shorter wavelengths to achieve nanoscale feature sizes with higher accuracy a...
IntroductionIn recent years, inspired by insect compound eyes, artificial biomimetic compound eyes have shown great advantages in overcoming the limitations of existing imaging devices such as large, bulky, and heavy, and improving the performance of medical endoscopy, panoramic imaging, micro navigation, and robot vision due to their unique optical imaging solutions such as small size, distortion...
Recently, Coherent, an American laser system solution provider, announced that all of the company's ultra fast laser business, including the manufacturing of all picosecond and femtosecond lasers, will be unified in one place: the Ultra Fast Center of Excellence in Glasgow, Scotland.Previously, Coherent's Ultra Fast Center of Excellence located in Glasgow was already a state-of-the-art mass produc...
Recently, the International Electrotechnical Commission Electronic Display Technology Committee (IEC TC110) International Standards Conference was held in Qingdao, attracting more than 120 experts, scholars, and technical representatives from around the world, including Japan, South Korea, and the United States. At the IEC TC110 conference, laser display technology has won wide recognition from in...
The latest progress in X-ray laser technology has opened up a new era of nanoscale exploration, bringing unprecedented opportunities for materials science and nanotechnology. Researchers have developed a novel imaging technique that can directly visualize separated nanosamples in free flight, capturing their complex structures with stunning details. This breakthrough method relies on single cohere...