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According to Korean media reports, Intel has acquired most of the high numerical aperture (NA) extreme ultraviolet (EUV) lithography equipment manufactured by ASML in the first half of next year.ASML plans to produce 5 high NA EUV lithography equipment this year, all of which will be supplied to Intel.They stated that ASML has an annual production capacity of approximately 5-6 High Numerical Apert...
Researchers have developed a 60 milliwatt solid-state DUV laser with a wavelength of 193 nanometers using LBO crystals, setting a new benchmark for efficiency values.In the fields of science and technology, utilizing coherent light sources in deep ultraviolet (DUV) regions is of great significance for various applications such as lithography, defect detection, metrology, and spectroscopy. Traditio...
It is reported that the research team of California Institute of Technology has developed an additive manufacturing (AM) technology based on hydrogel injection, which uses two-photon lithography technology to produce 3D metal with a characteristic resolution of about 100 nm.The relevant research is published in the journal Nano Letters, titled 'Suppressed Size Effect in Nanopillars with Hierarchy ...
The first all-Italian quantum cascade laser was born at the National Research Center in Pisa. The protagonists of this milestone are two researchers from the Nanoscience Institute, Lucia Sorba and Miriam Serena Vitiello, who together with their research team designed and developed this innovative device.In fact, quantum cascade lasers have unique potential for detecting gases and other molecules, ...
Scientists have advanced this field by stabilizing exciton polaritons in semiconductor photonic gratings, achieving long-lived and optically configurable quantum fluids suitable for complex system simulations.Researchers from Leicester CNR Nanotec and the School of Physics at the University of Warsaw used a new generation of semiconductor photonic gratings to optically customize the composite of q...