- 데이터 없음
한국어
- English
- 简体中文
- 繁体中文
- Français
- Русский
- Italiano
- 日本語
- 한국어
- Português
- Deutsch
- Español
- Türkçe
- Ελληνικά
- Nederlands
- Tiếng Việt
- Polski
Modern laser technology urgently requires nonlinear optical materials that can generate coherent light through second harmonic generation. However, only a small portion of the nonlinear optical properties of non centrosymmetric crystal materials have been experimentally or theoretically studied, and exploration for high-performance nonlinear optical crystal materials is still very limited.Recentl...
Super-resolution fluorescence microscopy surpasses the diffraction limit of what used to be a barrier by using fluorescent probes and specific excitation and emission programs. Most SR technologies heavily rely on image computation and processing to retrieve SR information. However, factors such as fluorescence group photophysics, chemical environment of the sample, and optical settings may cause ...
Engineer and inventor Ezequiel Pawelko is one of the creators of X Lidar, a laser technology that can detect volcanic ash in the atmosphere, draw safe flight paths, and maintain airport operations during volcanic eruptions. Nowadays, he is engaged in other applications such as detecting space debris, monitoring natural resources and fisheries, preventing fires, and drawing radiation and wind maps ...
On February 3, 2025, Lumentum Holdings has appointed Michael Hurlston as its President, CEO, and Director, effective from February 7. Hurlston replaces Alan Lowe, who has been serving as the company's President and CEO since 2015. Lowe will continue to serve as a member of Lumentum's board of directors and as a consultant to the company.Lumentum is a major supplier of high-speed optical transceive...
Recently, the semiconductor industry has adopted Extreme Ultraviolet Lithography (EUVL) technology. This cutting-edge photolithography technology is used for the continuous miniaturization of semiconductor devices to comply with Moore's Law. Extreme ultraviolet lithography (EUVL) has become a key technology that utilizes shorter wavelengths to achieve nanoscale feature sizes with higher accuracy a...