- No Data
English
- English
- 简体中文
- 繁体中文
- Français
- Русский
- Italiano
- 日本語
- 한국어
- Português
- Deutsch
- Español
- Türkçe
- Ελληνικά
- Nederlands
- Tiếng Việt
- Polski
Recently, Trumpf Group, a leading global provider of machine tools and laser technology solutions, announced that it has partnered with software company SiMa AI has signed a partnership agreement to develop lasers with artificial intelligence (AI).It is reported that SiMa. ai is a software centric embedded edge machine learning chip system company, and the goal of both parties is to equip Trumpf'...
German researchers have developed a method for controlling and manipulating optical signals by embedding liquid crystal layers into waveguides created by direct laser writing. This work has produced devices capable of electro-optic control of polarization, which may open up possibilities for chip based devices and complex photonic circuits based on femtosecond write waveguides.Researcher Alexandro...
Recently, a research team from the Astronomical Glaciology Laboratory under the RIKEN Nishina Center (RNC) of the Japanese Institute of Physics and Chemistry announced that they have developed a new laser based sampling system for studying the composition of glacier ice cores.The above image shows the discrete holes sampled 150mm from the shallow ice core of the Fuji Ice Dome in Japan (Southeast ...
Recently, the Thin Film Optics Research and Development Center of the High Power Laser Component Technology and Engineering Department of the Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, collaborated with researchers from Hunan University and Shanghai University of Technology to make new progress in the study of laser damage performance of mid infrared anti reflect...
On December 11th local time, New York State announced a partnership with companies such as IBM, Micron, Applied Materials, and Tokyo Electronics to jointly invest $10 billion to expand the Albany NanoTech Complex in New York State, ultimately transforming it into a high numerical aperture extreme ultraviolet (NA EUV) lithography center to support the development of the world's most complex and pow...