- Brak danych
Polski
- English
- 简体中文
- 繁体中文
- Français
- Русский
- Italiano
- 日本語
- 한국어
- Português
- Deutsch
- Español
- Türkçe
- Ελληνικά
- Nederlands
- Tiếng Việt
- Polski
Recently, Sivers Semiconductors, a well-known chip and integration module supplier in Sweden, announced that its subsidiary Sivers Photonics is partnering with ecosystem partners to showcase its advanced laser chip and array technology at the OFC conference in Santiago.The first on-site demonstration used Ayar Labs optical I/O and CW-WDM MSA compatible SuperNova ™ The light source is powered...
Recently, the team led by Wu Kaifeng, a researcher at the Dalian Institute of Chemical Physics, Chinese Academy of Sciences, and Zhu Jingyi, an associate researcher, has made progress in the interdisciplinary field of photochemistry and photophysics. The team directly observed the quantum coherence properties of hybrid free radical pairs composed of quantum dots and organic molecules, achieving ef...
Ensuring the integrity and quality of the welded hair clip is crucial in the assembly of electric motors. Usually, 160 to 220 hair clips are welded to each motor, and the accuracy of these welds directly affects the overall quality of the stator and motor. The traditional method of detecting these welds is difficult to balance the requirements of safety and accuracy, which often leads to damage to...
Recently, global laser giant Germany's Trumpf announced four personnel changes, namely Claudio Santopietro as the head of intelligent factory consulting and automation, Kevin Cuseo as the head of software sales, Julian Schorpp as the product manager for automatic bending products, and Adam Simons as the head of additive manufacturing for Trumpf North America.According to relevant information, Clau...
Recently, according to Tom's Hardware, Lawrence Livermore National Laboratory (LLNL) in the United States is developing a PW (1015 W) level large aperture thulium (BAT) laser. It is reported that this laser has the ability to increase the efficiency of extreme ultraviolet lithography (EUV) light sources by about 10 times, and may potentially replace the carbon dioxide laser used in current EUV too...