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Recently, a team led by Gao Chunqing and Fu Shiyao from the School of Optoelectronics at Beijing University of Technology combined optical spatial coordinate transformation with photon spin Hall effect to construct a photon angular momentum filter for the first time internationally, achieving on-demand regulation of photon spin angular momentum and orbital angular momentum.The related achievements...
Recently, according to the journal Nature Nanotechnology, a team from the California Institute of Technology reported that they have constructed a metasurface covered with micro adjustable antennas that can reflect incident light beams: one beam of light enters and multiple beams of light exit, each with a different frequency and propagating in a different direction. This is a new method for proce...
At the EPHJ exhibition, GF Machining Solutions will showcase its latest laser solutions for microfabrication and 3D surface texture processing. Inspired by 70 years of innovation in the machine tool industry and 15 years of mastery of laser technology, GF Machining Solutions' latest innovations enable manufacturers to take speed and accuracy to new levels - they can experience it firsthand at EP...
Recently, the Jiang Haihe Research Group of the Health Institute of the Chinese Academy of Sciences Hefei Institute of Materia Medica made important progress in the research of the high-energy pulsed laser transmission system in the mid infrared band, and designed a 78 μ The 6-hole microstructure anti resonant hollow core fiber (AR-HCF) with a larger core diameter achieved efficient transmissio...
Recently, the semiconductor industry has adopted Extreme Ultraviolet Lithography (EUVL) technology. This cutting-edge photolithography technology is used for the continuous miniaturization of semiconductor devices to comply with Moore's Law. Extreme ultraviolet lithography (EUVL) has become a key technology that utilizes shorter wavelengths to achieve nanoscale feature sizes with higher accuracy a...