- No Data
English
- English
- 简体中文
- 繁体中文
- Français
- Русский
- Italiano
- 日本語
- 한국어
- Português
- Deutsch
- Español
- Türkçe
- Ελληνικά
- Nederlands
- Tiếng Việt
- Polski
Recently, the Aerospace Laser Technology and System Department of the Shanghai Institute of Optics and Precision Mechanics, Chinese Academy of Sciences, and the East China Research Team of the Key Laboratory of Quantum Optics, Chinese Academy of Sciences, together with the research team of Professor Chen Liqing of East China Normal University, demonstrated a Rydberg microwave sensor with high sens...
In the breakthrough transformation towards sustainable industrial practices, LASIT is at the forefront of the ecological revolution in laser marking technology. This evolution is not just about labeling products; This is about marking a sustainable future.Environmental Innovation: A New Era of Industrial PrecisionLASIT's laser technology is a model of environmental protection. Unlike traditional m...
Recently, Associate Researcher Zhang Junyong from the High Power Laser Physics Joint Laboratory of the Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, together with Professor Zhao Yongpeng's research group from Harbin Institute of Technology and Professor Zhan Qiwen's research group from Shanghai University of Technology, completed the experimental verification of 46....
Summary:To filter out infrared light from the driving light source in the extreme ultraviolet lithography (EUVL) light source system, a rectangular grating structure needs to be fabricated on the surface of the collection mirror. However, the collection mirror grating usually undergoes deformation during the manufacturing process, resulting in a decrease in filtering efficiency. The process errors...
The Chinese Academy of Sciences reduced the volume of the deep ultraviolet laser by 90% and achieved 193 nm vortex beam output for the first time. Professor Xuan Hongwen described "loading truck equipment into the car trunk". This technology enables a 30% reduction in the size of lithography features, breaking through the bottleneck of the 2-nanometer process. In the next three years, laser power ...