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Recently, Professor Tsumoru Shintake from Okinawa University of Science and Technology (OIST) proposed a revolutionary extreme ultraviolet (EUV) lithography technology that not only surpasses the boundaries of existing semiconductor manufacturing, but also heralds a new chapter in the industry's future.This innovation significantly improves stability and maintainability, as its simplified design o...
According to Korean media reports, Intel has acquired most of the high numerical aperture (NA) extreme ultraviolet (EUV) lithography equipment manufactured by ASML in the first half of next year.ASML plans to produce 5 high NA EUV lithography equipment this year, all of which will be supplied to Intel.They stated that ASML has an annual production capacity of approximately 5-6 High Numerical Apert...
Recently, the research team of the State Key Laboratory of High-Field Laser Physics at the Shanghai Institute of Optics and Fine Mechanics of the Chinese Academy of Sciences has made progress in using high-field lasers to drive the even harmonic frequency shift of single-layer MoS2. The results were published in Optics Express under the title "Frequency shift of even-order high harmonic generation...
Recently, the research team of the High Power Laser Element Technology and Engineering Department of the Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, has made new progress in evaluating the laser damage resistance and damage mechanism of 532nm thin film polarizers using different laser damage test protocols. The related achievements were published in Optical Materi...
Recently, the Thin Film Optics Research and Development Center of the High Power Laser Component Technology and Engineering Department of the Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, collaborated with researchers from Hunan University and Shanghai University of Technology to make new progress in the study of laser damage performance of mid infrared anti reflect...