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Recently, the semiconductor industry has adopted Extreme Ultraviolet Lithography (EUVL) technology. This cutting-edge photolithography technology is used for the continuous miniaturization of semiconductor devices to comply with Moore's Law. Extreme ultraviolet lithography (EUVL) has become a key technology that utilizes shorter wavelengths to achieve nanoscale feature sizes with higher accuracy a...
EV Group, a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology, and semiconductor markets, and Silicon Austria Labs, a leading electronic systems research center in Austria, announced that SAL has received and installed multiple EVG lithography and photoresist processing systems in its MicroFab at the R&D cleanroom facility in Filach, Austria.These devices...
Hybrid 3D integrated optical transceiver. (A, B) Test setup: Place the photon chip (PIC) on the circuit board (green), and glue the electronic chip (EIC) onto the top of the photon chip. (C) It is the cross-section of the EIC-PIC component with micro protrusions. (D) Display the mesh of the finite element model.The latest progress in artificial intelligence, more specifically, is the pressure plac...
Not long ago, Nuburu, the developer of industrial blue light lasers, encountered a personnel change controversy. The departure of two senior executives from its board of directors resulted in a shortage of board members, and the originally scheduled special meeting for financing proposals was forced to be cancelled as a result. Recently, Nuburu announced two new director appointments that will tak...
Optical metamaterials are an effective way to utilize their superior photon capture capabilities. Therefore, perfect absorbers can be achieved through nanoscale resonant plasmas and metamaterial structures.Metamaterial perfect absorbers (MPAs) are typically composed of periodic subwavelength metals (such as plasma superabsorbers) or dielectric resonance units. Compared with static passive physical...