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LLNL has long been a pioneer in the development of EUV lithography technology.A laboratory located in California will lay the foundation for the next development of extreme ultraviolet (EUV) lithography technology. The project is led by Lawrence Livermore National Laboratory (LLNL) and aims to promote the next development of EUV lithography technology, centered around the laboratory's developed dr...
Professor Zhang Peilei's team from Shanghai University of Engineering and Technology, in collaboration with the research team from Warwick University and Autuch (Shanghai) Laser Technology Co., Ltd., published a review paper titled "A review of ultra shot pulse laser micromachining of wide bandgap semiconductor materials: SiC and GaN" in the international journal Materials Science in Semiconductor...
Recently, the Los Alamos National Laboratory (LANL) in the United States has developed a method for quantum light emitters, which stacks two different atomic thin materials together to achieve a light source that generates circularly polarized single photon streams. These light sources can also be used for various quantum information and communication applications.According to Han Htoon, a researc...
Adaptive optics is defined as an advanced optical system used to correct the transmission medium between the subject and the image, providing users with clearer images. Adaptive optics helps to use a complex combination of deformable mirrors to correct images in real-time through distortion in the Earth's atmosphere. These images are of greater importance in many vertical industries such as health...
The researchers estimate the period from 2023 to 2028. EUV lithography will address the limitations of traditional optical lithography, which has reached its physical limits in terms of resolution. The shorter wavelength of EUV light allows for the creation of smaller features and tighter patterns on silicon wafers, enabling the manufacture of advanced microchips with greater transistor densities....