- No Data
English
- English
- 简体中文
- 繁体中文
- Français
- Русский
- Italiano
- 日本語
- 한국어
- Português
- Deutsch
- Español
- Türkçe
- Ελληνικά
- Nederlands
- Tiếng Việt
- Polski
Recently, Gaota Semiconductor announced the successful development of an advanced 3D imager based on dToF technology for LiDAR applications. The newly developed product FL6031 is based on Tower's 65nm Stacked BSI CIS platform and has pixel level hybrid bonding function. It is the first in a series of products aimed at meeting the needs of numerous deep sensing applications in the automotive, consu...
It is reported that Japanese startup EX Fusion will soon reach an agreement with Australian space contractor Electric Optical Systems to conduct on-site testing of technology for tracking small space debris orbiting Earth.Image source: LeolabsEX Fusion, headquartered in Osaka, specializes in the laser business with the goal of achieving commercial laser fusion reactors. So far, nuclear fusion rese...
Recently, metal 3D printing manufacturer Meltio launched its latest metal 3D printer - M600. This M600 has shown significant progress in integrating into industrial manufacturing processes, no longer limited to niche applications. Like most of Meltio's product lines, the design of M600 was originally intended to address common manufacturing issues such as long delivery times, high inventory cost...
High energy, high average power femtosecond laser due to the attosecond high order harmonic generation, precision processing and manufacturing, biomedical and national defense and other fields of extensive application needs, is the forefront of ultrafast super laser technology research in the past decade.Especially fiber laser due to stable and reliable operation characteristics, compact structure...
Recently, according to Tom's Hardware, Lawrence Livermore National Laboratory (LLNL) in the United States is developing a PW (1015 W) level large aperture thulium (BAT) laser. It is reported that this laser has the ability to increase the efficiency of extreme ultraviolet lithography (EUV) light sources by about 10 times, and may potentially replace the carbon dioxide laser used in current EUV too...